A team at Hanbat National University in the Republic of Korea, led by Professor Joonsik Park, has developed a two-step boron and silicon coating method for high-entropy alloys, producing a robust heat shield. Their technique creates stable nano-grain-sized layers on TiTaNbMoZr alloys, yielding superior resistance to oxidation at temperatures as high as 1300 degrees Celsius.

The study compared simple silicon pack cementation with a sequential boron-silicon application. While uncoated and simply Si-coated alloys both suffered significant oxidation and cracking, the dual-layer B-Si coating maintained a structurally stable surface of XB2, XSi2, and X5SiB2 compounds, sharply increasing oxidation resistance. In experiments, B-Si coated samples showed far less mass gain after 10 hours at 1300 de

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